Book Details

Ohring's Materials Science of Thin Films: Deposition and Structure, Third Edition is an ideal resource for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films as well as scientists and engineers who are entering the field or require an overview of thin films. The book provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book, bringing the most important advances made since the publication of the previous edition. All chapters have been fully revised and include new illustrations, examples, and exercises.

Key Features

• Contains fully updated content including coverage of the latest and most important deposition techniques such as atomic layer deposition and high impulse magnetron sputtering
• Provides new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth
• Includes fully updated illustrations, new examples, and fully revised and expanded end-of-chapter problems